Semi-Automatic Wafer Grinder

The semi-automatic grinder features a more compact body design and is typically used in laboratory and light production line scenarios. The grinding center serves as the core unit for all grinder series, employing a frame made of granite material. Coupled with our independently developed high-power air bearing spindle and unique stroke mechanism, the machine can deliver high-quality surface results and precision.

Engineering Intents

Laboratory-friendly equipment size

Cast iron and marble combined machine body

Configurable with either a high-precision mechanical spindle or an aerostatic grinding spindle

Spindles of different power are configured for different materials

The worktable can clamp up to 3 different sizes of wafers

High stability enables a minimum grinding thickness of 5 micrometer

5-micron thick Si wafer
5-micron thick Si wafer
Geometric map - TTV
Geometric map - TTV

Specifications

Machine Model


PDG 1100 SAT

PDG 1150 SAT

PDG 1200 SAT

PDG 1300 SAT

Max. Clamping Diameter

mm

100 (4 inches)

150 (6 inches)

200 (8 inches)

300 (12 inches)

Grinding Wheel Diameter

mm

209

312

Grinding Rotation Rate

rpm

500 - 3500

Worktable Rotation Rate

rpm

10 - 450

Y-axis Feed Rate

 μm/s

0.1 - 80

Thickness Gauge Resolution

μm

0.1

Acoustic Emission Frequency

 kHz

20 - 1000

Total Power

kW

8.3

11

14

Total Weight

kgf

1700

1760

1920

Dimension (W×D×H)

 mm

1125×1350×2250

Features


1. Microporous Ceramic Chuck Table

The ceramic material, sintered at high temperatures, forms uniform “ant-nest” structures for even vacuum force distribution, preventing wafer damage. It is 11.8% stronger than similar ceramics and integrated with the worktable’s sealing module for enhanced precision and stability. Learn More

2. DYAN-X Control Software

DYAN-X is a human-machine interface (HMI) control software designed specifically for the Wafering Series, based on the Windows operating system. The software features an intuitive and straightforward design, enabling users to quickly understand and easily operate the system. Learn More

3. Air Bearing Spindle (Optional)

The air bearing grinding spindle uses dry, clean air through microporous layers to support the rotor shaft against the stator, enabling fast, smooth rotation without contact, ensuring exceptional accuracy and stability. Learn More

4. In-Machine Thickness Gauges

A high-precision thickness gauge ensures consistent grinding precision and accurate offset measurements for wheel wear. PONDA offers three options for monitoring wafer thickness under various grinding conditions. Learn More

Off Process Contact Gauge (OCG)

In Process Contact Gauge (ICG) (Optional)

In Process Non-Contact Gauge (ING) (Optional)

5. Acoustic Emission (Optional)

A built-in Acoustic Emission (AE) system in a grinding spindle is a sophisticated in-process monitoring tool that detects high-frequency sounds produced during the grinding process. Learn More

6. TAIKO Grinding (Optional)

After the TAIKO grinding process, the raised ring on the wafer’s back acts like a frame, reducing warpage and enhancing structural strength. Even with a wafer thickness as thin as 40 µm, operators can handle it by the ring without damage. Learn More


Model Defination

PDG

Wafer Grinder

1 · 2

One Grinding Spindle · Two Grinding Spindle

100 · 150 · 200 · 300

Max. Clamping Diameter

S

Semi Automatic

A · E

Air Bearing · Electric Spindle

T

Equipped with Thickness Gauge

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Partnering with us means gaining access to reliable, precision-engineered grinding and polishing solutions. With extensive industry experience and a commitment to quality, we provide expert support and equipment tailored to meet your specific needs.

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