Fully Automatic Wafer Grinder

The Fully Automatic Wafer Grinder utilizes dry-in-dry-out grinding mode and integrates numerous features. Meanwhile, the graphical user interface (GUI) screen enables real-time monitoring and control of all functional devices. The series is equipped with two sets of high-power air bearing spindles, responsible for rough and fine grinding respectively. By adapting to different grinding wheels, it can process wafers made from a variety of materials, at the meantime delivering the expected precision and long-term stability for wafer production.

Engineering Intents

Achieves fully automated wafer grinding: Wafer pick-and-place > Alignment and direction correction > Worktable cleaning > In-process thickness inspection > Coarse and fine grinding – Wafer cleaning and drying

The three vacuum worktables are driven by an aerostatic rotary platform

The work table can clamp up to 3 different sizes of wafers

Can be configured with a high-precision mechanical spindle or an aerostatic grinding spindle

Can be configured for fully automated TAIKO grinding


Fully Automatic Wafer Grinder Workflow
Fully Automatic Wafer Grinder Workflow

Specifications

Machine Model

PDG 2100 AT

PDG 2150 AT

PDG 2200 AT

PDG 2300 AT

Max. Clamping Diameter

mm

100 (4 inches)

150 (6 inches)

200 (8 inches)

300 (12 inches)

Grinding Wheel Diameter

mm

209

312

Grinding Rotation Rate

rpm

500 - 3500

Worktable Rotation Rate

rpm

10 - 450

Y-axis Feed Rate

μm/s

0.1 - 80

Thickness Gauge Resolution

μm

0.1

Acoustic Emission Frequency

 kHz

20 - 1000

Total Power

kW

14

17

23

Total Weight

kgf

3200

3400

3500

4000

Dimension (W×D×H)

mm

1350×3200×2000

1550 × 3630 × 2000

Features


1. Microporous Ceramic Chuck Table

The ceramic material, sintered at high temperatures, forms uniform “ant-nest” structures for even vacuum force distribution, preventing wafer damage. It is 11.8% stronger than similar ceramics and integrated with the worktable’s sealing module for enhanced precision and stability. Learn More

2. DYAN-X Control Software

DYAN-X is a human-machine interface (HMI) control software designed specifically for the Wafering Series, based on the Windows operating system. The software features an intuitive and straightforward design, enabling users to quickly understand and easily operate the system. Learn More

3. Air Bearing Spindle

The air bearing grinding spindle uses dry, clean air through microporous layers to support the rotor shaft against the stator, enabling fast, smooth rotation without contact, ensuring exceptional accuracy and stability. Learn More

4. In-Machine Thickness Gauges

A high-precision thickness gauge ensures consistent grinding precision and accurate offset measurements for wheel wear. PONDA offers three options for monitoring wafer thickness under various grinding conditions. Learn More

Off Process Contact Gauge (OCG) (Not Available)

In Process Contact Gauge (ICG)

In Process Non-Contact Gauge (ING) (Optional)

5. Acoustic Emission (Optional)

A built-in Acoustic Emission (AE) system in a grinding spindle is a sophisticated in-process monitoring tool that detects high-frequency sounds produced during the grinding process. Learn More

6. TAIKO Grinding (Optional)

After the TAIKO grinding process, the raised ring on the wafer’s back acts like a frame, reducing warpage and enhancing structural strength. Even with a wafer thickness as thin as 40 µm, operators can handle it by the ring without damage. Learn More

7. Bernoulli End Effector (Optional)

The Bernoulli end effector, almost no physical contact (a tiny support point, made of non-marking rubber, will come into contact with the wafer), leverages the effects of airflow to secure objects onto its surface. Learn More

Model Defination

PDG

Wafer Grinder

2

Two Grinding Spindles

100 · 150 · 200 · 300

Max. Clamping Diameter

A · E

Air Bearing · Electric Spindle

T

Equipped with Thickness Gauge

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